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Thin Film Fabrication

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Old Dominion University is always looking for ways in which professors of different disciplines can work together. Professor Mournir Laroussi, (left) electrical and computer engineering and Assistant Professor Venkat Maruthamuthu, mechanical and aerospace engineering, have found a way to generate a diffused plasma inside a chamber without applying any electrical power to the chamber. Since there are no electrodes inside the chamber, there is no contamination and no need for electrode replacement. Photo Chuck Thomas/ODU

ATC Orion 5 RF/DC Sputtering System (AJA International)

Features:

  • Main Deposition Chamber: 14.6" high x 12" OD, S/S vacuum chamber.

  • Con-Focal Sputtering: three 2'' magnetron sputter guns with integral isolation chimneys.

  • DC and RF Generators: two 300 Watt RF generators and one 750 Watt DC generator.

  • Quartz Crystal Thickness Monitor.

  • Substrate Holder: accommodates substrates up to 4" diameter; mounts to top of chamber for sputter up orientation; continous motorized rotation (0-40RPM) with controller; radiant heating to 850 C with quartz halogen lamps (+/- 1 degree C temp. stability); capable of being heated in an O2 environment;

  • Gas Handling: mass flow controlled gas line (Ar) - 20 sccm with pneumatic isolation valve(s) and filter.

  • Deposition Uniformity: typically +/- 2.5% thickness uniformity over a 4'' diameter substrates.

  • Base Chamber Vacuum: better than or equal to 3.0×10-8 Torr.

Savannah 100 ALD (UltraTech / Cambridge NanoTech)

Features:

  • Substrate Size: up to 200 mm

  • Substrate Temperature: 25°C - 500°C; ±0.2°C

  • Precursor Sources: Up to 6, heated

  • Deposition Uniformity: <±1%

  • Deposition: High speed/ultra high aspect ratio

  • Control: Labview-USB-PC

UHV PLD System

3118 E-beam evaporator (Varian)