ATC Orion 5 RF/DC Sputtering System (AJA International)

Features:

• Main Deposition Chamber: 14.6" high x 12" OD, S/S vacuum chamber.

• Con-Focal Sputtering: three 2'' magnetron sputter guns with integral isolation chimneys.

• DC and RF Generators: two 300 Watt RF generators and one 750 Watt DC generator.

• Quartz Crystal Thickness Monitor.

• Substrate Holder: accommodates substrates up to 4" diameter; mounts to top of chamber for sputter up orientation; continous motorized rotation (0-40RPM) with controller; radiant heating to 850 C with quartz halogen lamps (+/- 1 degree C temp. stability); capable of being heated in an O2 environment;

• Gas Handling: mass flow controlled gas line (Ar) - 20 sccm with pneumatic isolation valve(s) and filter.

• Deposition Uniformity: typically +/- 2.5% thickness uniformity over a 4'' diameter substrates.

• Base Chamber Vacuum: better than or equal to 3.0×10-8 Torr.

Savannah 100 ALD (UltraTech / Cambridge NanoTech)

Features:

• Substrate Size: up to 200 mm

• Substrate Temperature: 25°C - 500°C; ±0.2°C

• Precursor Sources: Up to 6, heated

• Deposition Uniformity: <±1%

• Deposition: High speed/ultra high aspect ratio

• Control: Labview-USB-PC
  

UHV PLD System

3118 E-beam evaporator (Varian)