Other Instrumentation

Specifications

LABmaster Glove Box Workstation (MBRAUN)

LABmaster Glove Box Workstation (MBRAUN)

PLA-501F Mask Aligner (Canon)

PLA-501F Mask Aligner (Canon)

Model 6000 Series Test Station (Micromanipulator)

Model 6000 Series Test Station (Micromanipulator)

Solaris 150 RTP System (Surface Science Integration)

Solaris 150 RTP System (Surface Science Integration)

The Solaris 150 is a manual loading RTP system for R&D and pre-production. The Solaris 150 can process up to 152.4mm substrates at a temperature range from RT- 1300 degrees. The unique temperature measurement system of the Solaris requires virtually no calibration for different wafer types and backside emmissivity differences.

The Solaris uses a unique PID process controller that ensures accurate temperature stability and uniformity. The system can accommodate four interlocked MFCs for gas mixing and forming gas processing. The Solaris is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.

Overview

  • Excellent repeatability by use of state of the art thermocouple signal conditioning.
  • User Friendly software that allows users to interact with data including 9 different graphing options.
  • Operating Temperature Range RT - 1300 Degrees Celsius
  • Gas Delivery system is capable of up to 6 Mass Flow controllers.
  • Zone control temperature for enhanced process control and allows for top side or bottom side heating only as an option.
  • Wafer Capability: 1″ to 6″ , Sample holders are available.
  • Sic Coated Susceptors available for III-V processing.

Quartz Liners Available for BPSG/PSG Processing

Plasma-Therm 790 Reactive Ion Etcher

Plasma-Therm 790 Reactive Ion Etcher

150 Watt Solar Simulator (Oriel)

150 Watt Solar Simulator (Oriel)

WS-400B-6NPP Spin Coater (Laurell)

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WS-400B-6NPP Spin Coater (Laurell)

X-ray Diffraction (XRD)

Rigaku MiniFlex II Desktop X-ray Diffractometer

MiniFlex II Benchtop X-ray Diffractometer (Rigaku)

The Rigaku Miniflex II can be used for a variety of applications from diffraction pattern comparison of polycrystalline materials such as powder samples and metal plates to qualitative and quantitative analyses and quality management of raw materials and products. The bench top instrument uses CuKα radiation and is ideal for quick data collections of both powder and thin-film samples ranging from simple oxides to complex compounds.

Measurements:

  • Phase identification
  • Phase quantification (phase ID)
  • Percent (%) crystallinity
  • Crystallite size and strain
  • Lattice parameter refinement
  • Rietveld refinement
  • Molecular structure

 

Scanning Probe Microscope / Atomic Force Microscope (SPM/AFM)

VEECO Dimension 3100

AFM - Dimension 3100 (Veeco)

The Dimension 3100 AFM is an instrument capable of imaging specimens with a horizontal and vertical resolution down to a fraction of a nanometer. The instrument works by measuring the deflection produced by a sharp tip on micron-sized cantilever as it scans across the surface of the specimen, which provides users the ability to characterize the surface roughness of materials and nanofabricated structures. Sample sizes that can be handled by the instrument range from small pieces to 4-inch diameter wafers.

Scanning Modes:

  • Tapping mode
  • Contact mode

 

Time-Resolved Electron Diffraction

Time-Resolved Electron Diffraction